Ion Implantation Technology-94: Proceedings of the Tenth International Conference on Ion Implantation Technology Catania, Italy, June 13-17, 1994
Coffa, S., Ferla, G., Priolo, F, Rimini, E. (eds.)
The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters. The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.
Thể loại:
Năm:
1995
Nhà xuát bản:
North-Holland
Ngôn ngữ:
english
Trang:
1012
ISBN 10:
0444821945
ISBN 13:
9780444821942
File:
PDF, 206.74 MB
IPFS:
,
english, 1995
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